Purpose: Scanning electron microscopy, high resolution lithography (chip scale)

Location: Lower East White Area

Material systems: Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire)

Scale/volume: Single chip up to max 50x50mm

Specifications/resolution: 2nm imaging capability, sub-10nm lithography; 500V – 30kV accelerating voltage