Location	UNSW – Upper East Lab (Grey Area)
Sample size	From small chips up to 6”
Gases	SF6, CF4, CHF3, O2, Ar,C4F8, N2
RF power	0-300W
Processes available	Si deep and shallow, SiO2, SiNx, Ge, Al2O3
Process Pressure range	5-250mTorr
Chiller temperature range	0-80°C
DC range	0-500V