| Location | UTS |
| Description | PLANCK maskless lithography system uses a 0.65″ 1920×1080 DMD and a 4 W UV source (365/385/405 nm) to project high-resolution patterns with feature sizes down to ~0.6–1.2 µm |
| Wafer size | TBC |
Supported By
| Location | UTS |
| Description | PLANCK maskless lithography system uses a 0.65″ 1920×1080 DMD and a 4 W UV source (365/385/405 nm) to project high-resolution patterns with feature sizes down to ~0.6–1.2 µm |
| Wafer size | TBC |