Wet Processing

Caustic Develop Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for handling of caustic based chemicals – primarily TMAH based developers
Location Wet Etch Bay, RPF Cleanroom
Material systems Wafers and/or photomasks; TMAH based developers
Scale / volume Substrates up to 7 inch square in size
Specs / resolution Includes automated spin and spray process unit for development of substrates

Chromium Etch Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for handling of chromium etch chemicals
Location Wet Etch Bay, RPF Cleanroom
Material systems Photomask (chromium etch process); substrate (etch chromium structures)
Scale / volume Etch substrates up to 7 inch square in size
Specs / resolution Includes automated spin process unit

EBL Spinner Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for resist coating processes dedicated to electron beam lithography resists
Location Wet Process Bay, RPF Cleanroom
Material systems EBL resists
Scale / volume Accommodates small samples up to 6 inch wafers
Specs / resolution Includes two spinners dedicated to PMMA and CSAR / ZEP processes

Etch Spin Rinse Dryer (ReynoldsTech)

Purpose Automated batch wafer cleaning tool
Location Wet Etch Bay, RPF Cleanroom
Material systems Can batch process substrates in a cassette
Scale / volume 2 inch, 4 inch, and 6 inch wafers; 4 inch and 5 inch photomasks
Specs / resolution Can accommodate up to 6 inch wafers, interchangeable rotors

General Purpose Acid Wet Benches (ReynoldsTech)

Purpose Exhausted wet bench used for handling of general purpose acids
Location Wet Etch Bay, RPF Cleanroom
Material systems General acid chemicals; substrates
Specs / resolution Includes two integrated stirring hotplates, heated and filtered process tank, and cascading tank for batch processing

General Purpose Caustic Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for handling of general purpose caustic based chemicals
Location Wet Etch Bay, RPF Cleanroom
Material systems General caustic / base chemicals; substrates
Specs / resolution Includes integrated stirring hotplate, heated and filtered process tank, and cascading tank for batch processing

HF Constant Temperature Bath

Location Upper East Lab (White Area)
Constant temperature bath 30C
HF solutions available – Si/SiO2 only HF 1:10 (HF 49% : DI water),

BHF 1:5 (HF49% : Ammonium fluoride 40%),

BHF 1:15 (HF49% : Ammonium fluoride 40%)

HF solutions available – general purpose (GP) BHF 1:15 (HF49% : Ammonium fluoride 40%)

HF Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for handling of hydrofluoric acid
Location Wet Etch Bay, RPF Cleanroom
Material systems Hydrofluoric acid
Scale / volume Small samples up to 4 inch wafers
Specs / resolution Includes heated process tank and cascading tank for rinsing

Hotplate Tower (ReynoldsTech)

Purpose Exhausted stacked hotplates for baking during solvent based processes
Location Wet Process Bay, RPF Cleanroom
Material systems Resist baking
Scale / volume Accommodates small samples up to 6 inch wafers
Specs / resolution Includes 6 hotplates dedicated to different temperature ranges – used for baking / outgassing purposes

Photo Spinner Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for resist coating processes dedicated to thicker photolithography based resists
Location Wet Process Bay, RPF Cleanroom
Material systems Substrates to be coated with photoresist
Specs / resolution Includes three spinners dedicated to positive, negative, and thick resist processes

Process Spin Rinse Dryer (ReynoldsTech)

Purpose Automated batch wafer cleaning tool
Location Wet Process Bay, RPF Cleanroom
Material systems Can batch process substrates in a cassette
Scale / volume 2 inch, 4 inch, and 6 inch wafers; 4 inch and 5 inch photomasks
Specs / resolution Can accommodate up to 6 inch wafers, interchangeable rotors

Solvent Develop Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for solvent based development processes
Location Wet Process Bay, RPF Cleanroom
Material systems Solvents
Scale / volume Accommodates small samples up to 6 inch wafers
Specs / resolution Includes cold plate for cold development processes

Solvent Lift-off Wet Bench (ReynoldsTech)

Purpose Exhausted wet bench used for solvent based metal lift-off and cleaning processes
Location Wet Process Bay, RPF Cleanroom
Material systems Substrates
Specs / resolution Includes 3 heated ultrasonic tanks, an ambient filtered tank, and a cascading tank