Location UNSW – West Lab (White Area)
Light source illumination i-line (365nm)
Light Intensity 10 mW/cm2
Resolution Down to 1 um

(depends on substrate size and flatness, resist type and thickness, and cleanroom conditions, and therefore, might vary for different processes)
Substrate size Pieces from 5x5mm2, to 6” wafer
Photomask size 4”, 5” and 7”
Exposure modes Contact (Soft, Hard, Vacuum, Low vacuum)

Flood exposure
Alignment method Top Side alignment (TSA)

Bottom Side alignment (BSA)