| Location | UTS |
| Description | 1700C 1000 mm single zone tube furnace |
| Wafer size | TBC |
| Available Gases | Ar, O2, N2, vacuum compatiable |
University: UTS
Polos Spin Coater
| Location | UTS |
| Description | Spin Coater |
| Wafer size | TBC |
Bruker Dektak Stylus profilometer
| Location | UTS |
| Description | surface height profiomter |
| Wafer size | TBC |
Planck Maskless Lithography System
| Location | UTS |
| Description | PLANCK maskless lithography system uses a 0.65″ 1920×1080 DMD and a 4 W UV source (365/385/405 nm) to project high-resolution patterns with feature sizes down to ~0.6–1.2 µm |
| Wafer size | TBC |
Suss Mask Aligner
| Location | UTS |
| Description | 365nm source, precision photolithography tool for high-accuracy optical alignment and controlled UV exposure |
| Wafer size | TBC |
