| Location | UTS |
| Description | 600W and 1200W ICP-RIE etchers with cold stage |
| Wafer size | 150 mm |
| Gas available | SF6, Cl2, Ar and O2 |
Supported By
| Location | UTS |
| Description | 600W and 1200W ICP-RIE etchers with cold stage |
| Wafer size | 150 mm |
| Gas available | SF6, Cl2, Ar and O2 |