Device Credit: Dr Alvaro Casas Bedoya. First working silicon photonic structures fabricated in RPF. Optical transmission achieved through 0.5mm and 1cm Silicon nanowires.
Key capabilities: Lithography, Wet Processing, Metrology, Dry Etching
Device Credit: Sebastian Pauka GaAs quantum dot, used to confine single electrons at ultra-low temperatures. 20nm wide gates written on the Elionix EBL. Key capabilities: Lithography, Wet Processing, Metrology
Device Credit: A/Prof. Luming Shen and Lauren Gaudion Patterned micro-scale channels fabricated from etched Silicon. This work is investigating how patterned surfaces can reduce friction between fluid and solid surfaces. Key capabilities: Lithography, Wet Processing, Metrology, Dry Etching
Device Credit: Dr Lining (Arnold) Ju Master moulds of patterned micro-channels are fabricated from etched Silicon. This device is designed to stop debris in blood from clogging channels before they hit the stenosis. Key capabilities: Lithography, Wet Processing, Metrology, Dry Etching
