Jeffrey Cheung is the process engineer responsible for the epitaxial growth tools at ANFF-NSW. His role involves user training and process optimisation for a wide range of materials grown in the Pascal pulsed laser epitaxial growth systems as well as growth of III-V heterostructures in the Veeco MBE.

Jeffrey’s background is in oxide heteroepitaxy via pulsed laser deposition. His previous research involved epitaxial nanocrystal growth of functional oxides using in-situ chemical and phase control of the epitaxial species. This research was the focus of his PhD in materials science at UNSW Australia.

Email: jeffrey.cheung@unsw.edu.au