The sessions will include a tool overview, a discussion of applications and case studies, then time for questions and answers

The first of these is on 24 June at 4pm AEST, and will focus on maskless lithography and their MLA systems. The rest of the schedule is:

  • Wednesday 7 July: DWL
  • Thursday 29 July: ULTRA
  • Thursday 12 August: Multiphoton Optics
  • Thursday 26 August: NanoFrazor

Find more information and register here.