Location | UNSW – West Lab (White Area) |
Light source illumination | i-line (365nm) |
Light Intensity | 10 mW/cm2 |
Resolution | Down to 1 um
(depends on substrate size and flatness, resist type and thickness, and cleanroom conditions, and therefore, might vary for different processes) |
Substrate size | Pieces from 5x5mm2, to 6” wafer |
Photomask size | 4”, 5” and 7” |
Exposure modes | Contact (Soft, Hard, Vacuum, Low vacuum)
Flood exposure |
Alignment method | Top Side alignment (TSA)
Bottom Side alignment (BSA) |