Location | UNSW – Upper East Lab (Grey Area) |
Sample size | From small chips up to 6” |
Gases | SF6, CF4, CHF3, O2, Ar,C4F8, N2 |
RF power | 0-300W |
Processes available | Si deep and shallow, SiO2, SiNx, Ge, Al2O3 |
Process Pressure range | 5-250mTorr |
Chiller temperature range | 0-80°C |
DC range | 0-500V |