Purpose: materials scouting via epitaxial growth techniques

Location: South lab

Substrate materials: wide range of substrate materials

Source materials: wide range of complex oxides and nitrides, target size up to 25mm diameter

Scale/volume: Single wafers up to 25mm diameter

Specifications: high energy 248nm excimer laser, in-situ reflective high energy electron diffraction (RHEED), substrate temperatures up to 1000C