Raith 150TWO Electron Beam Lithography System
| Location | UNSW – West Lab (White Area) |
| Sample size | From small chips up to 6” |
| SEM | ZEISS |
| Column | Gemini 0-30kV |
| Apertures | 7.5 10 15 20 30 60 120micron |
| FBMS | Available |
| Laser Height Sensing | Available |
| Focusing during exposure | By Column or by Stage Adjustment |
| Stitching Write Fields capability | Available |
| Smallest step size | 2nm |
| Beam shape | Spot |
| Minimum feature size | < 20nm |
| EBL resists available | Positive PMMA 950k, CSAR 9% and 18%, negative Ma-N2403 |
| Detectors | In-lens and SE |
