Purpose: High resolution lithography (wafer scale)

Location: West White Area

Material systems: Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire)

Scale/volume: Single wafer up to 200mm diameter (max write field 150 x 150mm)

Specifications/resolution: sub-10nm lithography; 10-30keV accelerating voltage; Fixed Beam Moving Stage option (stitch-free patterning over 150mm)